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ion-beam implantation

См. также в других словарях:

  • Ion Beam Mixing — is a process for adhering two multilayers, especially a substrate and deposited surface layer. The process involves bombarding layered samples with doses of ion radiation in order to promote mixing at the interface, and generally serves as a… …   Wikipedia

  • Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… …   Wikipedia

  • Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

  • Ion beam — An ion beam is a type of particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. Today s ion beam sources are typically derived from the mercury vapor thrusters… …   Wikipedia

  • Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… …   Wikipedia

  • Focused-Ion-Beam-Mikroskop — Foto eines FIB Arbeitsplatzes Ein Focused Ion Beam (Abk.: FIB; englisch für „fokussierter Ionenstrahl“) ist ein Gerät zur Oberflächenanalyse und bearbeitung. Steht der Materialabtrag im Vordergrund, heißt das Verfahren auch Ionendünnung. Wenn die …   Deutsch Wikipedia

  • Focused Ion Beam — Foto eines FIB Arbeitsplatzes Ein Focused Ion Beam (Abk.: FIB; englisch für „fokussierter Ionenstrahl“, deutsch auch Ionenfeinstrahlanlage) ist ein Gerät zur Oberflächenanalyse und bearbeitung. Steht der Materialabtrag im Vordergrund, heißt das… …   Deutsch Wikipedia

  • Ion implantation — is a materials engineering process by which ions of a material can be implanted into another solid, thereby changing the physical properties of the solid. Ion implantation is used in semiconductor device fabrication and in metal finishing, as… …   Wikipedia

  • ion implantation — Electronics. a method of implanting impurities below the surface of a solid, usually a semiconductor, by bombarding the solid with a beam of ions of the impurity. [1960 65] * * * ion implantation noun The introduction of ions into a crystalline… …   Useful english dictionary

  • ion implantation — Electronics. a method of implanting impurities below the surface of a solid, usually a semiconductor, by bombarding the solid with a beam of ions of the impurity. [1960 65] * * * …   Universalium

  • Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… …   Wikipedia

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